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Silicon-Germanium Strained Layers and Heterostructures
The study of Silicone Germanium strained layers has broad implications for material scientists and engineers, in particular those working on the design and modelling of semi-conductor devices. Since the publication of the original volume in 1994, there has been a steady flow of new ideas, new understanding, new Silicon-Germanium (SiGe) structures and new devices with enhanced performance. Written for both students and senior researchers, the 2nd edition of Silicon-Germanium Strained Layers and Heterostructures provides an essential up-date of this important topic, describing in particular the recent developments in technology and modelling.* Fully-revised and updated 2nd edition incorporating important recent breakthroughs and a complete literature review* The extensive bibliography of over 400 papers provides a comprehensive and coherent overview of the subject* Appropriate for students and senior researchers
Index of Patents Issued from the United States Patent and Trademark Office
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Official Gazette of the United States Patent and Trademark Office
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Rapid Thermal Processing for Future Semiconductor Devices
This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokkaido in 1997. The RTP 2001 covered the latest developments in RTP and other short-time processing continuously aiming to point out the future direction in the Silicon ULSI devices and II-VI, III-V compound semiconductor devices.This book covers the following areas: advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe, hetero-structure, novel metallization, inter-connect, silicidation, low-k materials, thin dielectrics including gate dielectrics and high-k materials, thin film deposition including SiGe, SOI and SiC, process and device modelling, Laser-assisted crystallization and TFT device fabrication technologies, temperature monitoring and slip-free technologies.
Printing Technology for Flexible Substrates
A huge revolution is emerging in the format and manufacturing process of electronic devices including displays brought on by the use of plastic substrates and printing technology. Flexible substrates enable large displays that can be freely bent, lightweight, and easily transported, as a result. In addition, the new technology has the potential of achieving various new devices such as e-paper, a new display medium, which epitomizes the advantage of hard copy paper; solar cells which are 1/10 the weight; sensors that can be completely embedded in floors and personal clothing.This report analyzes the latest trends in the technology and materials surrounding the manufacturing process of flexible electronic devices, with the above exciting breakthrough features.
Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition
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Microtas 2004
The Eighth International Conference on Miniaturized Systems in Chemistry and Life Science - B5Tas 2004 - is an annual meeting focusing on the research, development and application of miniaturized technologies and methodologies in chemistry and life science. The conference is celebrating its tenth anniversary after the first workshop at the University of Twente, The Netherlands in 1994. This research field is rapidly developing and changing towards a domain where core competence areas such as microfluidics, micro- and nanotechnology, materials science, chemistry, biology, and medicine are melting together to a truly interdisciplinary meeting place. This volume is the first in a two volume set, a valuable reference collection to all working in this field.
Proceedings of the Symposium on Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Materials Synthesis
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